• 专利附录
  • 专利说明
  • 权利要求
  • 类似技术
  • 同族专利
  • 引用文献
  • 法律状态
  • 优先权
    • 专利摘要:
    It is known that over time impurities accumulate in a plate heat exchanger during operation. This reduces the performance of the plate heat exchanger and it is necessary to take the plate heat exchanger out of operation to remove the impurities and achieve the desired performance again. The invention relates to a method and apparatus for continuously cleaning a plate heat exchanger, in order to avoid the accumulation of particles and subsequent solid coatings on the plates of the plate heat exchanger. A plate heat exchanger is described as self-cleaning, but the self-cleaning effect is strongly dependent on the flow rate across the plates. By blinding off a part of the plate heat exchanger, the flow rate is increased over the part that is not blinded off, and is thereby cleaned. Fig. 3 shows how the apparatus has inserted an aperture (pos. 1) into the inlet duct (pos. The rinsing process takes place while the plate heat exchanger is in operation, takes approx. 5 min., And can be repeated as needed.
    公开号:DK201900545A1
    申请号:DKP201900545
    申请日:2019-05-03
    公开日:2021-01-06
    发明作者:Kjær Christiansen Carsten
    申请人:Kjær Christiansen Carsten；
    IPC主号:
    专利说明:

    DK 2019 00545 A1 |
    |
    DESCRIPTION | The cyp invention relates to a method of flushing away those particles which would otherwise accumulate in a plate heat exchanger at normal fw.
    By blinding a section of the plate heat exchanger, one will increase the How speed, of the liquid which runs over the plate heat growth pads in the section of plate | the heat exchanger which is not blinded off.
    This washes away particles that would otherwise remain on the pla | and become coatings, at normal flow.
    Subsequently, the apertures are moved to rinse a | second section of the plate heat exchanger, this is repeated until all sections of the plate heat exchanger | is flushed with high flow, This flushing test takes place while the plate heat exchanger is in normal operation, | and can be repeated as needed. |
    16 |
    The invention also relates to a method of rinsing away the particles which would otherwise accumulate | in a plate heat exchanger at usually How.
    By dazzling a smaller (down to I space channel) section of | plate heat exchanger with an ACTIVE aperture, it is possible to practice the How Speed or change | the flow of the liquid flowing in the plate chancellor or plates which the active aperture has blinded | afl This is done by connecting the active aperture to a pump which increases / reverses the flow, and | thereby rinsing accumulated particles away from precisely these plate channels, This allows of | flush a plate heat exchanger while in operation and very Hille disturbance of operation as only a small pro- | waiting part of the plate channels has had a higher flow or changed Tlow direction during the rinsing process, | while the rest of the pad heat exchanger has operated during normal operation.
    This skyHeproce takes place |
    28 - while the plate heat exchanger is in normal operation and can be repeated as required. |
    The invention also relates to an apparatus which can place the orifices in the inlet | of the plate heat exchanger very discharge duct, over the sections that are desired to be blinded by.
    When activated, they are positioned on the inlet or outlet duct of the plate heat exchanger.
    The aperture can have the shape of a tube, one half |
    23 - pipes or a shape which is optimal for stopping the flow of a part of the plates of the plate heat exchanger, | at the same time as the liquid can pass past the diaphragms to also be able to rinse the rear section | of the plate heat exchanger, By blinding one part of the plates off, for example 30%, the liquid will now | should run over balvt as many plates and thus double the velocity of liquid over the plates, |
    The design, location or number of the aperture can be varied so that it is possible to dazzle the desired part |
    Of the plates of, for example, 80%, for a fivefold increase in the flow rate. |
    The invention also relates to an apparatus with an AKTTV aperture. An active aperture is an aperture which is: | connected to a pump via a flexible tube so that the active aperture can be placed over the desired section | in the plate heat exchanger inlet or outlet channel, By activating the pump it is possible to increase | the flow rate over the plates where the active aperture is located.
    By shaping the active aperture |
    : DK 2019 00545 A1 | so it only dazzles a small section, all the way down to I plate channel, it is possible to increase the flow rate and thus flush the plate heat exchanger the plates in this section, by drug of minimal pump capacity, and minimal impact on the plate heat exchanger performance during rinsing.
    By using the active aperture, while reversing the flow retention on the pump, it is possible to backflush a smaller |
    Section of the plate heat exchanger at a time while the plate heat exchanger is in operation. | It is known that over time impurities accumulate in a plate heat exchanger during operation.
    The impurities | derived from the liquid circulating in the exchanger, and deposits may be salts, oxides, of biological | species or particles.
    This concept is called fouling.
    When fouling occurs, coatings form on var- | the exchange plates which reduce the ability of the plate to transfer heat.
    An accumulation of particles can | close areas in the exchanger so that those areas cannot transfer heat.
    After some time, plate heat- | the exchanger could not transfer. the desired amount of heat and it is necessary to clean the exchanger, | 3 methods are used to clean these impurities from the plate heat exchanger plates, One method is | chemical cleaning, where aggressive liquids are often circulated in the plate heat exchanger and thus | over the plates in the hope of dissolving deposits and thus cleaning the plates.
    Another method is | Backflushing, where you reverse the flow direction of the liquid in the plate heat exchanger to flush impurities- | out of the plate heat exchanger.
    A third method is to open the plate heat exchanger takes | the plates out to clean each plate mechanically and often also chemically, then the plates are reassembled. | Common to all 3 methods is that the plate heat exchanger must be taken out of operation for a period. and that there is | high costs associated with cleaning a plate heat exchanger: It is also known that a plate | | heat exchanger is described as self-cleaning, due to the turbulence that is created when the liquid with | a certain speed runs over the pattern of the plates.
    To reduce or eliminate fouling in a plate- | heat exchanger, a high velocity of the liquid over the plates is desired, this gives greater turbulence, and | better distribution of the flow over the plates, which reduce the possibility of deposits forming | - on the plates.
    To dimension a plate heat exchanger with high flow rate and high turbulence over | the plates, however, will give a high pressure drop across the exchanger and give too high pumping costs, at the same time | with that it can be difficult to achieve the desired heat transfer. | Based on the above problem and known facts, that is the purpose of the | The present invention to provide a method and apparatus for increasing the flow rate, alternatively tively change the flow direction in a part of a plate heat exchanger in operation, for the purpose of flushing up | accumulated impurities before they become solid deposits, as with the known methods it requires long- '| durable operation stops and expensive man-hours, to clean a plate heat exchanger for coatings, clean plate- | heat exchangers often only when the performance has dropped to an unacceptable level.
    This results in pla- | the heat exchangers for longer periods operate with reduced power, and increased pumping costs |
    : DK 2019 00545 A1 | nails cause energy loss and increased energy consumption.
    Using this invention, it is possible to | perform a rinsing process on an hourly, daily, weekly or monthly basis as needed. A rinsing process can be activated manually or controlled from a control room. The rinsing process has a duration of approx. 10 min. depending on how many growth chancellors are rinsed at a time.
    The rinsing process takes place while plate- | the heat exchanger is in operation and will provide reduced performance during the rinsing process.
    By applying it | active aperture it is possible to flush a small part of the plate heat exchanger at a time, and thereby will | the impact on the performance of the plate heat exchanger during operation must be minimal during the rinsing process. | The object of the present invention is to provide a method and an apparatus for continuously
    - Rinse accumulated impurities in a plate heat exchanger before they become solid deposits, and there- | with reducing or eliminating the use of the known methods, all of which require taking plate- | the heat exchanger out of operation to clean the plates. | The object of the invention is achieved by utilizing and increasing the self-cleaning effect as a plate heat- | 18 - bills have.
    The plates jen plate heat exchanger are embossed with a pattern so that when the liquid as | running between 2 plates {plate channel) will be turbulent, this to be able to give off so much energy to | the plate as possible, which is then absorbed by the liquid running on the other side of the plate.
    There are | different patterns depending on how much turbulence you want, This turbulence helps to keep | the plate heat exchanger clean before particles up this is described as the plate heat exchanger itself self-cleaning | Effect, the same for all plate patterns is that the velocity of the liquid over the plates is decisive for how large | the turbulence is and thus the self-cleansing effect.
    Often a plate heat exchanger is designed so ba- | the stiffness and thus the turbulence is too low to keep the plate heat exchanger clean. | In fig. 1 is a sketch of a plate heat exchanger seen from the outside.
    The appliance can be mounted on a plate heating | 23 - fixed cover of the exchanger (pos8) or movable cover (posS) extending inlet channel (pos ) | or outlet duct (pos9). Fig. 2 shows a sectional drawing of a plate heat exchanger in sections A-Å, with appa- | steering wheel mounted on the movable cover {pos3) with adeang to the inlet duct (pos2), here in neutral | position and without naked influence on the operation of the plate heat exchanger, It is illustrated how the liquid | enters the plate heat exchanger via the fixed cover (pos8) and into the mdleb channel (pos2) and | - then distributes evenly in the plate channels (posi) and then runs out of the plate heat exchanger- | clean fixed cover (pos8) show the outlet channel (pos9. | Operation of the appliance with aperture Follow requirements 1. | Fig. 3 shows the appliance mounted on the movable cover (pos5) with access to the inlet duct | - (pos2), here the appliance is activated for the first time part of the rinsing process.
    According to claim 1, the apparatus has a |
    , DK 2019 00545 A1 |
    © blend (post) into the rear part of the inlet chancel {pos2), which is now blinded off.
    It is illustre- | how the liquid enters the plate heat exchanger via the fixed cover (pos8) and into the inlet
    the duct (pos2) and then distributes the first part of the plate ducts (fpos10) over the KLIN and then flows out of the fixed cover of the plate heat exchanger (pos8) via the outlet duct
    {pos9). By the fact that the same amount of liquid must now run in half as many plate channels (pos10) will | the velocity of the liquid in the plate channels (pos10) will be doubled and the self-cleaning effect will | become four times as large, thereby flushing accumulated particles away from the plate channels (pos10). On | Fig. 4 shows the device mounted on the movable cover (pos ) with access to the inlet duct (pos2), | here the appliance is activated for the second part of the rinsing process.
    The device quickly has an aperture (post) in | the front part of the inlet duct fpos2), which is now blinded.
    Thereby the rinsing process is performed by | the rear part of the plate channels (pøs10). At the end of the rinsing process, return the aperture (pos. 19) | to the neutral position as shown in FIG. 2. The appliance also consists of a duct extension (post) which functions- | re as an extension of the inlet or outlet channel where the aperture (pos!) can be placed when the appliance is not | is in operation.
    The placement of the lumbar (pos!) Is done here by activating a threaded spindle (pos6) as |
    IS - held in position via a spindle anchor (Dos7) and a spindle anchor with shaft seal (pos3) at the bottom of | the channel extender (pos4). The threaded spindle (pos6) which passes through the duct extension (pos4) can then | activated from the outside.
    The aperture (pos!) Location can also be done using other solutions such as by- | draulik, pneumatics, rotation or other. |
    The operation of the active aperture device according to claim 2 |
    Fig. S shows the device with active aperture (pos!) Mounted on the movable cover (posS) with | access to the inlet duct (pas2), here in neutral position and without any influence on plate heat- | the operation of the exchanger.
    Fig. 6 shows the active aperture (posi!) Inserted into the inlet channel (pos2), the active | aperture is in the drawing made so that it apertures 3 plate channels (pos 10), show liquid intake (pos 12), |
    - pump (pos13) and telescopic pipe (pos 14) it is now possible to increase the flow in the 3 plate channels |
    (pas! 0) and thereby flush accumulated particles away from precisely these 3 plate channels (pos. 10), By acti- | The threaded spindle (pos. 1) is passed through the inlet canopy (pos. 2) and | teat hook to neutral position and the pump (pas13) is stopped.
    Thereby all plate channels (pos 10) have become | flushed, this at the same time as the plate heat exchanger and all plate channels (pos10) have been in operation. |
    This allows flushing of a plate heat exchanger while in operation and very little disturbance of | operation, as only a small percentage of the plate channels (pos. 10) have had a higher flow or changed | flow direction during the rinsing process, while the rest of the plate heat exchanger has operated during normal | operation.
    This rinsing process takes place while the plate heat exchanger is in normal operation and can be repeated | as needed, |
    |
    权利要求:
    Claims (4)
    [1]
    Method for rinsing away the particles that would otherwise accumulate in a plate heat exchanger at normal flow while the plate heat exchanger is in operation. Characterized by dimming one or more sections of the plate heat exchanger, thereby increasing the flow rate, of the liquid flowing over | Plate heat exchanger the plates in the section of the plate heat exchanger nails are not blinded off. Thereby | particles that would otherwise remain on the plates and become solid coatings are washed away by normal | flow. Subsequently, shutter arms are moved to flush another section of the plate heat exchanger, this | repeated until all sections of the plate heat exchanger have been flushed with high flow, This rinsing process | takes place while the plate heat exchanger is in normal operation, and can be repeated as needed. | |
    [2]
    2. Method for rinsing away the particles that would otherwise accumulate in a plate heat exchanger | at normal flow, while the plate heat exchanger is 1 drill. Characterized by dazzling a smaller sec- | tion (down to 1 plate channel) of the plate heat exchanger with an ACTIVE aperture. The active aperture is | connected to a pump which increases or reverses the flow, thereby rinsing accumulated | 18 - particles away from the blinded section. Subsequently, the active aperture is moved to rinse a | second section of the plate heat exchanger, this is repeated until all sections of the plate heat exchanger | is rinsed. This rinsing process takes place while the plate heat exchanger is in normal operation and can be repeated given as needed, | -
    [3]
    Apparatus according to claim I, for mounting on a fixed heat exchanger (pos8) or movable | ge cover (pos5) in extension of inlet channel (pos ) or inlet channel (pos). Characterized by a | device which, when activated, places one or more apertures in the inlet or |. of the plate heat exchanger outlet duct, over the sections that are desired to be blinded off while the plate heat generator is in operation. | Aperture can have the shape of a tube, a half tube or a shape that is optimal for stopping the flow | over a part of the plates of the plate heat exchanger, at the same time as the liquid can pass past the diaphragms | to also be able to flush the rear section of the plate heat exchanger, |
    [4]
    Apparatus according to claim 2, for mounting on a plate heat exchanger's fixed cover (pos) or movable | cover (pos5) in extension of inlet duct (pos2) or outlet duct (pos9). Characterized by a | Apparatus which, when activated, places an active aperture in the inlet duct or outlet of the plate heat exchanger | running duct, over the plate duct or ducts which are to be flushed while the plate heat exchanger is in operation. | The active aperture can, via liquid intake (pos12), pump (pos13) and telescopic tube (pos 14) increase | or reverse the flow in the very plate channels where the active aperture is located. The device can lead | the active aperture through the inlet duct or outlet duct and return, thereby rinsing | - all plate channels. |
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    同族专利:
    公开号 | 公开日
    DK180491B1|2021-05-27|
    引用文献:
    公开号 | 申请日 | 公开日 | 申请人 | 专利标题
    法律状态:
    2021-01-06| PAT| Application published|Effective date: 20201104 |
    2021-05-27| PME| Patent granted|Effective date: 20210527 |
    优先权:
    申请号 | 申请日 | 专利标题
    DKPA201900545A|DK180491B1|2019-05-03|2019-05-03|Method and apparatus for cleaning a plate heat exchanger in operation.|DKPA201900545A| DK180491B1|2019-05-03|2019-05-03|Method and apparatus for cleaning a plate heat exchanger in operation.|
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